Tunneling Electroresistance Effect with Diode Characteristic for Cross-Point Memory

Hong-Sub Lee1,2, Hyung-Ho Park1

  • 1Department of Materials Science and Engineering, Yonsei University , Seodaemun-Ku, Seoul 120-749, Korea.

Summary

This study introduces a novel ferroelectric tunnel diode memristor for cross-point memory architecture. It effectively eliminates sneak currents, enabling high-density integration and improved performance.

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