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A new Optics Beamline at BESSY-II is operational for characterizing optical devices. It provides high-quality UV and XUV measurements, including gratings and nano-optics, with excellent stray light control.

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Area of Science:

  • Optics and Photonics
  • Synchrotron Radiation Science
  • Materials Characterization

Background:

  • Advanced optical components require precise characterization.
  • Ultraviolet (UV) and Extreme Ultraviolet (XUV) spectral regions are critical for many applications.
  • BESSY-II provides a unique facility for advanced light source research.

Purpose of the Study:

  • To report the successful operation and commissioning of a new Optics Beamline at BESSY-II.
  • To present performance data validating the beamline's design for characterizing optical devices.
  • To highlight the beamline's capabilities for UV and XUV spectral measurements.

Main Methods:

  • Commissioning of a new Optics Beamline coupled with a UHV reflectometer.
  • At-wavelength characterization of gratings, nano-optical devices, mirrors, and multilayer systems.
  • Analysis of beamline key parameters including high-order suppression and stray light.

Main Results:

  • The Optics Beamline is successfully operating at BESSY-II.
  • Commissioning data correlate well with initial design calculations.
  • Key parameters like high-order suppression and stray light behavior meet stringent quality requirements.

Conclusions:

  • The new Optics Beamline is a valuable facility for at-wavelength characterization in the UV and XUV.
  • The beamline is ready for user operation, supporting research on novel optical devices.
  • The successful commissioning confirms the beamline's capability to deliver high-quality measurements.