At-wavelength metrology facility for soft X-ray reflection optics

Area of Science:

• Optics and Photonics
• Synchrotron Radiation Science
• Materials Characterization

Background:

• Advanced optical components require precise characterization.
• Ultraviolet (UV) and Extreme Ultraviolet (XUV) spectral regions are critical for many applications.
• BESSY-II provides a unique facility for advanced light source research.

Purpose of the Study:

• To report the successful operation and commissioning of a new Optics Beamline at BESSY-II.
• To present performance data validating the beamline's design for characterizing optical devices.
• To highlight the beamline's capabilities for UV and XUV spectral measurements.

Main Methods:

• Commissioning of a new Optics Beamline coupled with a UHV reflectometer.
• At-wavelength characterization of gratings, nano-optical devices, mirrors, and multilayer systems.
• Analysis of beamline key parameters including high-order suppression and stray light.

Main Results:

• The Optics Beamline is successfully operating at BESSY-II.
• Commissioning data correlate well with initial design calculations.
• Key parameters like high-order suppression and stray light behavior meet stringent quality requirements.

Conclusions:

• The new Optics Beamline is a valuable facility for at-wavelength characterization in the UV and XUV.
• The beamline is ready for user operation, supporting research on novel optical devices.
• The successful commissioning confirms the beamline's capability to deliver high-quality measurements.