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Form-Profiling of Optics Using the Geometry Measuring Machine and the M-48 CMM at NIST.

Nadia Machkour-Deshayes1, John Stoup1, Z Q John Lu1

  • 1National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.

Journal of Research of the National Institute of Standards and Technology
|June 9, 2016
PubMed
Summary
This summary is machine-generated.

A new Geometry Measuring Machine (GEMM) prototype accurately measures complex optical surface profiles. This instrument achieves nanometer-level uncertainties, demonstrating its potential for high-precision optical metrology.

Keywords:
asphere and free form opticsform-profilometryoptical calibration metrologysurface metrology

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Area of Science:

  • Optical Engineering
  • Metrology
  • Surface Science

Background:

  • Accurate measurement of aspheric and free-form optical surfaces is critical for advanced optical systems.
  • Existing metrology techniques may struggle with the complexity and precision required for next-generation optics.

Purpose of the Study:

  • To develop and validate a novel instrument, the Geometry Measuring Machine (GEMM), for high-accuracy optical surface profile error measurement.
  • To assess the repeatability and comparability of GEMM measurements for nanometer-resolution metrology.

Main Methods:

  • Reconstructing optical profiles from local surface curvature measurements using the GEMM prototype.
  • Evaluating instrument repeatability over three months using a stable elliptical mirror.
  • Comparing GEMM measurements with those from a NIST Moore M-48 coordinate measuring machine.

Main Results:

  • GEMM demonstrated a repeatability of 3 nm root mean square (rms) over a three-month period.
  • Reconstructed profiles from GEMM and the M-48 coordinate measuring machine showed a difference of 6 nm rms (22 nm peak-to-valley).
  • The instrument achieved measurement uncertainties near 1 nm for optical profile errors.

Conclusions:

  • The prototype GEMM successfully measures complex-shaped optics with high accuracy and repeatability.
  • The demonstrated comparability with established metrology instruments validates GEMM's potential for nanometer-resolution optical measurements.
  • GEMM offers a promising solution for the precise characterization of advanced optical surfaces.