Screening mechanisms at polar oxide heterointerfaces

Seungbum Hong1, Serge M Nakhmanson, Dillon D Fong

  • 1Materials Science Division, Argonne National Laboratory, Argonne, IL 60439, USA. Department of Materials Science & Engineering, KAIST, Daejeon 305-701, Korea.

Summary

This review explores charge screening mechanisms at polar oxide heterostructure interfaces. Understanding and manipulating these mechanisms can lead to novel electronic properties and tunable functionalities in advanced materials.

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