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Metal-Semiconductor Junctions01:24

Metal-Semiconductor Junctions

1.3K
The contact of metal and semiconductor can lead to the formation of a junction with either Schottky or Ohmic behavior.
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
1.3K
Biasing of Metal-Semiconductor Junctions01:27

Biasing of Metal-Semiconductor Junctions

767
Biasing metal-semiconductor junctions involves applying a voltage across the junction. Specifically, the metal is connected to a voltage source, while the semiconductor is grounded. This technique is essential for controlling the direction and magnitude of current flow in electronic devices, including diodes, transistors, and photovoltaic cells.
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
767
MOSFET: Enhancement Mode01:22

MOSFET: Enhancement Mode

974
Enhancement-mode MOSFETs are pivotal components in electronics, distinguished by their capacity to act as highly efficient switches. They are part of the larger family of metal-oxide Semiconductor Field-Effect Transistors (MOSFETs). They are available in two types: p-channel and n-channel, each tailored to specific polarity operations.
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
974
Semiconductors01:22

Semiconductors

1.8K
There is variation in the electrical conductivity of materials - metals, semiconductors, and insulators that are showcased with the help of the energy band diagrams.
Metals such as copper (Cu), zinc (Zn), or lead (Pb) have low resistivity and feature conduction bands that are either not fully occupied or overlap with the valence band, making a bandgap non-existent. This allows electrons in the highest energy levels of the valence band to easily transition to the conduction band upon gaining...
1.8K
Field Effect Transistor01:29

Field Effect Transistor

1.5K
Field-effect transistors (FETs) are integral to electronic circuits and distinguished by their three-terminal setup: the gate, drain, and source. These transistors operate as unipolar devices, which utilize either electrons or holes as charge carriers, in contrast to bipolar transistors, which use both types of carriers. The primary function of the FET is to modulate the flow of these carriers from the source to the drain through a channel. The voltage difference between the gate and source...
1.5K
Types of Semiconductors01:20

Types of Semiconductors

1.7K
Intrinsic semiconductors are highly pure materials with no impurities. At absolute zero, these semiconductors behave as perfect insulators because all the valence electrons are bound, and the conduction band is empty, disallowing electrical conduction. The Fermi level is a concept used to describe the probability of occupancy of energy levels by electrons at thermal equilibrium. In intrinsic semiconductors, the Fermi level is positioned at the midpoint of the energy gap at absolute zero. When...
1.7K

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Related Experiment Video

Updated: Mar 18, 2026

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
07:12

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics

Published on: August 28, 2018

10.6K

Valley-engineered ultra-thin silicon for high-performance junctionless transistors.

Seung-Yoon Kim1, Sung-Yool Choi1, Wan Sik Hwang2

  • 1School of Electrical Engineering, KAIST, Daejeon, 305-701 Korea.

Scientific Reports
|July 9, 2016
PubMed
Summary
This summary is machine-generated.

Extremely thin silicon channels exhibit enhanced performance due to quantum confinement. This study demonstrates a junctionless field-effect transistor (FET) with a 500% mobility increase at room temperature via valley engineering.

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Area of Science:

  • Solid State Physics
  • Materials Science
  • Nanotechnology

Background:

  • Extremely thin silicon (2-D like structure) offers mechanical flexibility and enhanced performance via quantum confinement.
  • Valley engineering in silicon is key to achieving novel electronic properties.

Purpose of the Study:

  • To demonstrate a junctionless field-effect transistor (FET) exhibiting room temperature quantum confinement effect (RTQCE).
  • To achieve RTQCE through valley engineering in ultra-thin silicon.

Main Methods:

  • Utilizing valley engineering via strain-induced band splitting and quantum confinement in ultra-thin silicon.
  • Achieving high tensile strain and controlled silicon surface roughness.
  • Fabricating a 2.5 nm thick silicon channel junctionless FET.

Main Results:

  • Demonstrated room temperature quantum confinement effect (RTQCE).
  • Achieved a significant device mobility increase of approximately 500% in the 2.5 nm silicon channel.
  • Verified the effectiveness of valley engineering through controlled strain and surface roughness.

Conclusions:

  • Ultra-thin silicon channels with valley engineering enable significant performance enhancements.
  • Junctionless FETs are a viable platform for exploiting RTQCE in silicon.
  • This approach opens new avenues for advanced semiconductor device development.