High energy X-ray phase and dark-field imaging using a random absorption mask

Hongchang Wang1, Yogesh Kashyap1, Biao Cai2,3

  • 1Diamond Light Source Ltd, Harwell Science and Innovation Campus, Didcot, OX11 0DE, UK.

Scientific Reports
|July 29, 2016
PubMed
Summary

High energy X-ray imaging can see deeper into materials with less damage, but it often lacks contrast. This study introduces a new method using a random absorption mask to generate phase and dark-field signals. The mask creates a pattern that is used to extract detailed images without needing complex optics. The method works with both synchrotron and lab-based X-ray sources. The researchers found that the technique can image thick or dense materials effectively. The results suggest this approach could be a practical alternative for high-energy X-ray imaging in materials science.

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