Analysis of the Effect of Silicon with Nano-Size Surface Structure on an Electrode Formed Using Screen Printing

In this paper, we report an investigation into the effects of the texturing size of silicon on the efficiency of a screen-printed Si solar cell. To accomplish this, we produced solar cells with various textured surfaces. The method we used to produce these cells included methods such as anisotropic chemical etching (texturing size of about 4 μm) using a mixed solution of KOH and IPA, reactive ion etching (texturing size of about 0.2 μm), and Ag catalyzed etching (texturing size of about 90 nm). The solar cells with an Ag-catalyzed etching textured structure showed the lowest efficiency of 11.87%, with the highest series resistance of 1.32 Ω. In the case of anisotropic chemical etching, the solar cell had the best efficiency of 17.84%, with the lowest series resistance. This means that the electrodes and silicon surfaces were not well-connected with the nano-sized textured silicon surface. The results revealed that conventional silver paste at an average of 1.6 μm is unsuitable for nano-sized textured Si solar cells.