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Aperiodic Mo/Si multilayers for hard x-rays.

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    Researchers developed aperiodic Molybdenum/Silicon (Mo/Si) multilayers (MLs) for hard X-ray reflection. These advanced Mo/Si multilayers achieve 28% reflectivity, ideal for imaging applications.

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    Area of Science:

    • Materials Science
    • Optics
    • X-ray Physics

    Background:

    • Aperiodic multilayers (MLs) are crucial for advanced X-ray optics.
    • Molybdenum/Silicon (Mo/Si) systems are promising for hard X-ray applications.
    • Fabricating Mo/Si MLs for hard X-rays presents unique manufacturing challenges.

    Purpose of the Study:

    • To develop and characterize aperiodic Mo/Si multilayers for reflecting 16.25 keV photons.
    • To address manufacturing challenges associated with high-reflectivity hard X-ray MLs.
    • To evaluate the performance of these MLs for imaging applications.

    Main Methods:

    • Fabrication of aperiodic Mo/Si multilayers with precise thickness control.
    • Characterization of multilayer structure and interfacial properties.
    • Experimental measurement of reflectivity at 16.25 keV and grazing incidence.

    Main Results:

    • Successfully developed aperiodic Mo/Si MLs for 16.25 keV photon reflection.
    • Achieved an average experimental reflectivity of 28% within a narrow angular acceptance.
    • Demonstrated control over interfacial silicide layers and avoided undesirable Mo phase transitions.

    Conclusions:

    • Aperiodic Mo/Si MLs are feasible for hard X-ray applications.
    • The developed MLs show potential for imaging highly diverging X-ray sources.
    • This work advances the design and fabrication of advanced X-ray optical components.