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Plasma enhanced vortex fluidic device manipulation of graphene oxide
Darryl B Jones1, Xianjue Chen1, Alexander Sibley1
1Centre for Nanoscale Science and Technology, School of Chemical and Physical Sciences, Flinders University, GPO Box 2100, Adelaide, SA 5001, Australia. darryl.jones@flinders.edu.au colin.raston@flinders.edu.au.
Chemical Communications (Cambridge, England)
|August 11, 2016
Summary
A novel vortex fluid device enables non-thermal plasma liquid processing in dynamic thin films. This microfluidic platform modifies graphene oxide morphology and chemistry in water.
Area of Science:
- Materials Science
- Chemical Engineering
- Plasma Physics
Background:
- Non-thermal plasma (NTP) is a promising tool for chemical synthesis and material modification.
- Microfluidic devices offer precise control over reaction environments.
- Graphene oxide (GO) is a versatile material with applications in electronics, energy, and biomedicine.
Purpose of the Study:
- To develop a vortex fluid device (VFD) integrating non-thermal plasma liquid processing.
- To demonstrate the platform's capability for chemical processing using colloidal graphene oxide in water.
- To investigate the manipulation of graphene oxide morphology and chemical character.
Main Methods:
- A custom-designed vortex fluid device was utilized.
- Non-thermal plasma was generated within dynamic thin films of liquid.
- Colloidal graphene oxide in water was processed using the VFD.
- Morphological and chemical characterization of processed graphene oxide was performed.
Main Results:
- The vortex fluid device successfully integrated non-thermal plasma liquid processing.
- The platform demonstrated effective chemical processing of graphene oxide.
- Significant manipulation of graphene oxide morphology and chemical character was observed.
- The dynamic thin film environment within the VFD facilitated efficient plasma-liquid interactions.
Conclusions:
- The developed VFD represents a novel microfluidic platform for advanced chemical processing.
- This technology enables precise control over material properties through plasma-liquid interactions.
- The VFD holds potential for various applications in materials science and nanotechnology, particularly for modifying nanomaterials like graphene oxide.
