Related Experiment Video
Updated: Mar 15, 2026

07:17
Non-equilibrium Microwave Plasma for Efficient High Temperature Chemistry
Published on: August 1, 2017
13.3K
Plasma mirrors for short pulse KrF lasers
Barnabás Gilicze1, Angéla Barna1, Zsolt Kovács2
1Department of Experimental Physics, University of Szeged, Dóm tér 9, H-6720 Szeged, Hungary.
The Review of Scientific Instruments
|September 3, 2016
Summary
Plasma mirrors are now applicable to Krypton Fluoride (KrF) laser systems, achieving high reflectivity through optimized beam quality. This breakthrough enables new possibilities for high-power laser applications.
Area of Science:
- Laser physics
- Plasma physics
- Optics
Background:
- High-power laser systems require efficient and high-quality beam manipulation.
- Plasma mirrors offer potential for high reflectivity but their application in specific laser systems like KrF lasers has been limited.
- Optimizing plasma mirror performance is crucial for advanced laser technologies.
Purpose of the Study:
- To demonstrate the successful application of plasma mirrors in Krypton Fluoride (KrF) laser systems for the first time.
- To optimize plasma mirror performance for high reflectivity and good reflected beam quality.
- To assess the feasibility of using plasma mirrors in high-power laser systems.
Main Methods:
- Investigated the use of plasma mirrors with KrF laser systems.
- Optimized the beam quality incident on the plasma mirror to enhance reflectivity.
- Characterized the spectral shift and reflected beam quality of the plasma mirror.
Main Results:
- Achieved high reflectivity up to 70% using plasma mirrors in KrF laser systems.
- Demonstrated that optimization of beam quality is key to achieving high reflectivity.
- Observed a modest spectral shift and good reflected beam quality from the plasma mirror.
Conclusions:
- Plasma mirrors are successfully applicable to KrF laser systems.
- Optimized plasma mirrors can provide high reflectivity (up to 70%) and good beam quality.
- The demonstrated performance allows for applicability in high-power laser systems, with a new arrangement suggested for such use.

