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Updated: Mar 14, 2026

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis
Published on: May 10, 2021
Fault-tolerant and finite-error localization for point emitters within the diffraction limit
We developed a self-interference technique to measure the separation between two incoherent point sources, even when they overlap. This method offers a robust solution for high-resolution imaging applications.
Area of Science:
- Optics and Photonics
- Interferometry
- Image Processing
Background:
- Accurate measurement of source separation is crucial in various scientific fields.
- Existing methods face challenges with overlapping or low-visibility sources.
Purpose of the Study:
- To introduce a novel self-interference technique for determining the separation between two incoherent point sources.
- To demonstrate the method's effectiveness even when sources completely overlap.
Main Methods:
- Implementation of a self-interference technique based on image inversion interferometry.
- Application of advanced data analytics for precise separation estimation.
- Experimental validation of the technique's performance.
Main Results:
- Successful estimation of source separation with finite error, including cases of complete source overlap.
- Demonstrated good tolerance to experimental noise and misalignment.
- Validation of the technique's feasibility through experimental results.
Conclusions:
- The developed self-interference technique provides a reliable method for measuring the separation of incoherent point sources.
- The technique's robustness makes it suitable for high-resolution instruments in microscopy and astronomy.
- This method offers a promising advancement for optical metrology and imaging systems.
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