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Efficient Self-Contained Photoacid Generator System Based on Photochromic Terarylenes
Ruiji Li1, Takuya Nakashima2, Rui Kanazawa1
1Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara, Japan.
New photoacid generators (PAGs) based on photochromic terarylenes offer high sensitivity. Modifications improved quantum yield for acid generation, demonstrating potential as photocatalysts in resist systems.
Area of Science:
- Organic Chemistry
- Photochemistry
- Materials Science
Background:
- Photoacid generators (PAGs) are crucial in photolithography.
- Developing highly efficient and sensitive PAGs is an ongoing research area.
- Terarylene-based PAGs offer unique photochemical properties.
Purpose of the Study:
- To synthesize and characterize novel neutral photoacid generators based on photochromic terarylenes.
- To investigate the effect of structural modifications on the quantum yield (QY) of acid generation.
- To evaluate the performance of a mesylic acid-releasing PAG as a photocatalyst.
Main Methods:
- Synthesis of terarylene-based compounds with modified hetero-aromatic moieties (thiazolyl and thienyl groups).
- Photochemical studies to determine quantum yields for acid generation under varying conditions (solvents, acid source).
- Evaluation of PAG performance in a chemically amplified positive resist system.
Main Results:
- Novel terarylene-based PAGs were successfully prepared.
- Quantum yields for acid generation reached up to 0.6 and 0.7 with structural modifications.
- Aromatic leaving groups were found to decrease photoefficiency.
- The mesylic acid-releasing PAG demonstrated photocatalytic activity in a resist system.
Conclusions:
- Structural modifications of terarylene-based PAGs significantly enhance acid generation efficiency.
- Optimized PAGs show high quantum yields, suitable for advanced photolithography.
- These PAGs represent promising photocatalysts for chemically amplified resist applications.
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