Chiral templating of alumina nanofilms by the atomic layer deposition process

O L Shalev1, Y Carmiel1, R Gottesman1

  • 1Department of Chemistry, Bar-Ilan Institute of Nanotechnology and Advanced Materials (BINA), Bar-Ilan University, Ramat Gan, 5290002, Israel. Yitzhak.Mastai@biu.ac.il.

Chemical Communications (Cambridge, England)
|October 7, 2016
PubMed

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