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Updated: Mar 14, 2026

A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
Side-Gated In2O3 Nanowire Ferroelectric FETs for High-Performance Nonvolatile Memory Applications
Meng Su1, Zhenyu Yang1, Lei Liao1
1Department of Physics and Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education Wuhan University Wuhan 430072 China.
Abstract:
A new type of ferroelectric FET based on the single nanowire is demonstrated. The design of the side-gated architecture not only simplifies the manufacturing process but also avoids any postdeposition damage to the organic ferroelectric film. The devices exhibit excellent performances for nonvolatile memory applications, and the memory hysteresis can be effectively modulated by adjusting the side-gate geometries.
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