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Related Concept Videos

Atomic Emission Spectroscopy: Instrumentation01:22

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The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.
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The wavelengths of visible light ultimately limit the maximum theoretical resolution of images created by light microscopes. Most light microscopes can only magnify 1000X, and a few can magnify up to 1500X. Electrons, like electromagnetic radiation, can behave like waves, but with wavelengths of 0.005 nm, they produce significantly greater resolution up to 0.05 nm as compared to 500 nm for visible light. An electron microscope (EM) can create a sharp image that is magnified up to 2,000,000X.
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In 1931, physicist Ernst Ruska—building on the idea that magnetic fields can direct an electron beam just as lenses can direct a beam of light in an optical microscope—developed the first prototype of the electron microscope. This development led to the development of the field of electron microscopy. In the transmission electron microscope (TEM), electrons are produced by a hot tungsten element and accelerated by a potential difference in an electron gun, which gives them up to 400...
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Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
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Preparing a Celadonite Electron Source and Estimating Its Brightness
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A stand-alone compact EUV microscope based on gas-puff target source.

Alfio Torrisi1, Przemyslaw Wachulak1, Łukasz Węgrzyński1

  • 1Institute of Optoelectronics, Military University of Technology, Warsaw, Poland.

Journal of Microscopy
|October 22, 2016
PubMed
Summary
This summary is machine-generated.

A new compact desk-top transmission extreme ultraviolet (EUV) microscope achieves sub-50 nm resolution using a laser-plasma source. This advanced imaging tool offers superior detail compared to visible light microscopy for various samples.

Keywords:
EUV microscopyEUV sourceFresnel zone plategas-puff targetimaging

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Area of Science:

  • Optics and Photonics
  • Microscopy
  • Plasma Physics

Background:

  • Traditional microscopy methods often lack the resolution required for nanoscale imaging.
  • Extreme ultraviolet (EUV) radiation offers shorter wavelengths for potentially higher resolution imaging.
  • Developing compact and practical EUV sources and microscopes remains a challenge.

Purpose of the Study:

  • To develop a compact, desk-top transmission extreme ultraviolet (EUV) microscope.
  • To achieve sub-50 nm spatial resolution for imaging microscopic objects.
  • To characterize and optimize the performance of the EUV source and microscope system.

Main Methods:

  • Utilized a laser-plasma source with a double stream gas-puff target for EUV generation.
  • Employed a multilayer ellipsoidal condenser for focusing and spectral narrowing of EUV radiation (λ = 13.8 nm).
  • Used a Fresnel zone plate objective for image formation.

Main Results:

  • Demonstrated a compact, desk-top transmission EUV microscope.
  • Achieved a spatial (half-pitch) resolution of sub-50 nm.
  • Successfully imaged test objects and other samples, showing superior resolution to visible light microscopy.

Conclusions:

  • The developed compact EUV microscope is capable of high-resolution nanoscale imaging.
  • The laser-plasma source and optical design are effective for transmission EUV microscopy.
  • This technology offers a significant advancement over visible light microscopy for detailed sample analysis.