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Updated: Mar 11, 2026

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015
Nanoelectromechanical device fabrications by 3-D nanotechnology using focused-ion beams
Reo Kometani1, Sunao Ishihara1
1Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan.
Abstract:
Nanoelectromechanical devices, which can be used as nanotools in nanofactories, were fabricated by focused ion beam chemical vapor deposition (FIB-CVD). The devices are made of diamond-like carbon (DLC), deposited on a Si substrate using gasified phenanthrene (C14H10) as a carbon source. The Young modulus and density of the deposited DLC were measured as 190 GPa and 3.8 g cm-3, respectively. The work function was smaller for DLC (2.9 eV) than for W (4.7 eV) and Fe (5.2 eV) deposited by FIB-CVD. A nanomanipulator was manufactured by FIB-CVD and used for actual manipulations. A glass capillary based local field emitter was developed and produced as a tool for spot deposition, and its electron field emission was confirmed. FIB-CVD is proven as an efficient fabrication technology of novel nanoelectromechanical devices.

