Recent progress in GeSi electro-absorption modulators
Papichaya Chaisakul1, Delphine Marris-Morini1, Mohamed-Said Rouifed1
1Institut d'Electronique Fondamentale, Université Paris-Sud, CNRS UMR 8622, Bât. 220, F-91405 Orsay Cedex, France.
Abstract:
Electro-absorption from GeSi heterostructures is receiving growing attention as a high performance optical modulator for short distance optical interconnects. Ge incorporation with Si allows strong modulation mechanism using the Franz-Keldysh effect and the quantum-confined Stark effect from bulk and quantum well structures at telecommunication wavelengths. In this review, we discuss the current state of knowledge and the on-going challenges concerning the development of high performance GeSi electro-absorption modulators. We also provide feasible future prospects concerning this research topic.
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