Synthesis and Characterization of Carbon Nitride Films for Micro Humidity Sensors

Nano-structured carbon nitride (CN_x) films were synthesized by a reactive RFmagnetron sputtering system with a DC bias under various deposition conditions, and theirphysical and electrical properties were investigated with a view to using them for microhumidity sensors. The FTIR spectra of the deposited films showed a C=N stretching bandin the range of 1600~1700 ㎝⁻1, depending on the amount of nitrogen incorporation. Thecarbon nitride films deposited on the Si substrate had a nano-structured surfacemorphology with a grain size of about 20 nm, and their deposition rate was 1.5 μm/hr. Thesynthesized films had a high electrical resistivity in the range of 10⁸ to 10⁸ ω·cm,depending on the deposition conditions. The micro humidity sensors showed a goodlinearity and low hysteresis between 5 ~ 95 %RH.