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Updated: Mar 11, 2026

Applying X-ray Imaging Crystal Spectroscopy for Use as a High Temperature Plasma Diagnostic
Published on: August 25, 2016
A micro-scale plasma spectrometer for space and plasma edge applications (invited)
E E Scime1, A M Keesee1, M Dugas2
1Department of Physics, West Virginia University, Morgantown, West Virginia 26506-6315, USA.
This study presents a novel plasma spectrometer utilizing microchip technology. The design demonstrates effective energy analysis and collimation, suitable for plasma diagnostics.
Area of Science:
- Physics
- Engineering
- Materials Science
Background:
- Plasma diagnostics require sophisticated instrumentation for accurate measurements.
- Existing plasma spectrometers can be bulky and expensive.
- Advances in microfabrication offer opportunities for miniaturization and cost reduction.
Purpose of the Study:
- To describe a novel plasma spectrometer design.
- To leverage lithography and microchip stacking for spectrometer fabrication.
- To evaluate the performance of key spectrometer components.
Main Methods:
- A plasma spectrometer was designed using lithography and microchip stacking.
- Curved plate energy analyzers and collimators were etched into a silicon wafer.
- Spectrometer elements were tested using a 5 keV electron beam.
Main Results:
- Collimator transmission measurements agreed with design targets.
- Energy selectivity measurements were in good agreement with design targets.
- The fabricated spectrometer elements showed promising performance.
Conclusions:
- The described plasma spectrometer design is feasible.
- The silicon wafer-based spectrometer elements are suitable for plasma diagnostics.
- A single wafer element can serve as a plasma processing or fusion first wall diagnostic.
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