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Regenerative Electroless Etching of Silicon.

Kurt W Kolasinski1, Nathan J Gimbar1, Haibo Yu2

  • 1Department of Chemistry, West Chester University, West Chester, PA, 19383-2115, USA.

Angewandte Chemie (International Ed. in English)
|December 8, 2016
PubMed
Summary

Regenerative electroless etching (ReEtching) is a novel semiconductor nanostructuring method. It uses a regenerated oxidant to control etching rate and extent, producing highly luminescent porous silicon.

Keywords:
electrochemistryelectroless etchingnanostructuresphotoluminescenceporous silicon

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Semiconductor Manufacturing

Background:

  • Electroless etching is a common method for semiconductor fabrication.
  • Controlling the reaction rate and extent in etching processes is crucial for producing desired nanostructures.
  • Existing methods may face limitations in precise control or material compatibility.

Purpose of the Study:

  • To introduce and describe a new method called Regenerative electroless etching (ReEtching).
  • To demonstrate the capability of ReEtching for producing nanostructured semiconductors.
  • To showcase the application of ReEtching in creating highly luminescent nanocrystalline porous silicon.

Main Methods:

  • ReEtching utilizes a primary oxidant (Ox1) as a catalyst for semiconductor reaction.
  • A secondary oxidant (Ox2) regenerates the primary oxidant, enabling sustained etching.
  • The reaction involves injecting holes into the semiconductor valence band, controlled by Ox2 addition and injection rate.

Main Results:

  • Demonstrated ReEtching for producing highly luminescent, nanocrystalline porous silicon.
  • Successfully used Vanadium pentoxide (V2O5) in hydrofluoric acid (HF) as Ox1 and hydrogen peroxide (H2O2) as Ox2.
  • Showcased precise control over the reaction extent and rate through Ox2 management.

Conclusions:

  • Regenerative electroless etching (ReEtching) offers a novel and controllable approach to nanostructured semiconductor production.
  • The method allows for the synthesis of high-quality, luminescent porous silicon.
  • ReEtching provides a tunable platform for semiconductor nanostructure fabrication.