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Plasma Processing with Fluorine Chemistry for Modification of Surfaces Wettability
Veronica Satulu1, Maria Daniela Ionita2, Sorin Vizireanu3
1National Institute for Lasers, Plasma and Radiation Physics, Atomistilor 409, Magurele-Bucharest, Ilfov 077125, Romania. veronica.satulu@infim.ro.
Molecules (Basel, Switzerland)
|December 17, 2016
Summary
Plasma techniques enable surface fluorination for advanced materials. Researchers achieved conformal fluorinated films and superhydrophobic surfaces using specific plasma methods and fluorinated compounds.
Area of Science:
- Materials Science
- Plasma Physics
- Surface Chemistry
Background:
- Plasma processing is crucial for material surface modification.
- Fluorinated compounds are essential in various material applications.
Purpose of the Study:
- To explore plasma techniques for effective surface fluorination.
- To investigate the creation of conformal fluorinated thin films.
- To achieve superhydrophobic surfaces through plasma treatment.
Main Methods:
- Magnetron sputtering of polytetrafluoroethylene (PTFE) targets for fluorocarbon film deposition.
- Plasma-assisted chemical vapor deposition (PACVD) using tetrafluoroethane.
- Plasma treatment of carbon nanowalls in a sulfur hexafluoride (SF6) environment.
Main Results:
- Conformal fluorinated thin films were successfully obtained.
- Superhydrophobic surfaces were achieved, dependent on initial surface properties.
- Demonstrated versatility of plasma methods for surface fluorination.
Conclusions:
- Plasma techniques offer viable routes for surface fluorination.
- Tailoring plasma conditions allows for controlled surface properties, including superhydrophobicity.
- The study highlights the potential of plasma-based fluorination in material processing.
