Improve optics fabrication efficiency by using a radio frequency ion beam figuring tool.

Area of Science:

• Optics and Photonics
• Plasma Physics
• Materials Science

Background:

• Ion beam figuring requires high removal rates and small ion beam diameters.
• Reducing extraction grid openings decreases ion beam diameter but also lowers removal rates.
• Ion beam removal rate is significantly influenced by ion density within the ion source.

Purpose of the Study:

• To investigate methods for enhancing ion beam figuring performance.
• To compare ion density in hollow cathode (HC) and radio frequency (RF) ion sources.
• To develop and test a novel RF ion source for improved ion beam characteristics.

Main Methods:

• Plasma simulation of hollow cathode (HC) and radio frequency (RF) ion sources.
• Development of an RF ion source with an integrated matching network.
• Experimental testing of the developed RF ion source for ion beam removal rate and diameter.

Main Results:

• Simulations indicated higher ion density in the RF ion source compared to the HC ion source.
• The developed RF ion source achieved an ion beam removal rate of 193 nm/min.
• This performance was achieved with a 10 mm extraction grid opening.

Conclusions:

• The RF ion source demonstrates superior performance for ion beam figuring compared to HC sources.
• The developed RF ion source design effectively increases ion density, leading to higher removal rates.
• This technology offers a promising solution for achieving high-precision material removal in optical fabrication.