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Laboratory Setup for Scanning-Free Grazing Emission X-ray Fluorescence.

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Summary
This summary is machine-generated.

This study presents a new laboratory setup for soft X-ray grazing emission X-ray fluorescence (GEXRF) spectroscopy. The technique enables nanometer-resolved elemental depth profiling for applications in the semiconductor industry.

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Area of Science:

  • Materials Science
  • Analytical Chemistry
  • Spectroscopy

Background:

  • Grazing incidence and grazing emission X-ray fluorescence (GI/GE-XRF) spectroscopy offers non-destructive elemental depth profiling at the nanometer scale.
  • Existing setups often require specialized facilities or longer measurement times.

Purpose of the Study:

  • To present a laboratory setup for soft X-ray GEXRF measurements.
  • To demonstrate nanometer-resolved elemental depth profiling using a laboratory source.
  • To validate the potential for in-situ process control in industries like semiconductors.

Main Methods:

  • Utilized a laser-produced plasma (LPP) source for high brilliance.
  • Employed a scanning-free GEXRF setup with a large detection solid angle.
  • Used a pnCCD detector in single photon counting mode for energy dispersion.
  • Analyzed a nickel-carbon multilayer sample with a lateral bilayer thickness gradient.

Main Results:

  • Achieved reasonable measurement times by combining LPP source and scanning-free setup.
  • Recorded GEXRF profiles of Ni-Lα,β lines at various positions.
  • Simulations predicted an intensity minimum correlating with bilayer thickness.
  • Successfully retrieved the bilayer thickness gradient, showing good agreement with other techniques (XRR, conventional XRF, TEM).

Conclusions:

  • The realized GEXRF setup serves as a proof-of-principle for nanometer-resolved elemental depth profiling.
  • The soft X-ray GEXRF technique with a laboratory source shows significant potential for industrial applications.
  • This method opens possibilities for in-line or in-situ process control in semiconductor manufacturing.