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Effect of background pressure on Co/C multilayers.
Applied Optics
|February 4, 2017
Summary
Increasing background pressure during cobalt/carbon multilayer deposition reduces x-ray reflectivity. Higher pressures also increase interlayer roughness and interdiffusion, negatively impacting film quality.
Area of Science:
- Materials Science
- Thin Film Technology
- Surface Science
Background:
- Multilayer thin films are crucial for various optical and magnetic applications.
- Controlling deposition conditions is essential for achieving desired film properties.
- Residual background gases can significantly influence thin film growth and characteristics.
Purpose of the Study:
- To investigate the impact of background pressure on the structural and reflective properties of cobalt/carbon multilayers.
- To understand the role of residual gases in interlayer diffusion and roughness.
- To optimize the deposition process for high-quality Co/C multilayers.
Main Methods:
- Deposition of Co/C multilayers using direct current magnetron sputtering.
- Characterization using grazing incidence hard x-ray reflectivity (GIXR) and soft x-ray reflectivity (SXR).
- Analysis of elemental composition and interdiffusion using x-ray photoelectron spectroscopy (XPS).
Main Results:
- X-ray reflectivity of Co/C multilayers decreases with increasing background pressure.
- Interlayer roughness increases with higher background pressures.
- Enhanced interdiffusion between cobalt and carbon layers is observed at elevated background pressures.
Conclusions:
- Background pressure is a critical parameter affecting the quality of Co/C multilayers.
- Higher background pressures lead to degraded reflectivity due to increased roughness and interdiffusion.
- Minimizing background pressure is recommended for fabricating high-performance Co/C multilayer films.
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