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Stress control in optical thin films by sputtering and electron beam evaporation
Applied Optics
|February 4, 2017
Summary
Controlling internal stress in optical thin films prevents defects. A novel combination deposition method successfully modulated stress between electron beam evaporation and sputtering techniques.
Area of Science:
- Materials Science
- Optics
- Thin Film Technology
Background:
- Internal stress in optical thin films can lead to critical failures like peeling and cracking.
- Different deposition methods yield films with varying internal stress characteristics.
Purpose of the Study:
- To investigate and control the internal stress of optical thin films.
- To compare stress levels produced by different deposition techniques.
Main Methods:
- Sputtering deposition
- Electron beam (EB) evaporation
- A novel combination deposition method
Main Results:
- Internal stress was successfully controlled using the developed combination method.
- The achieved internal stress values fell between those obtained from EB evaporation and sputtering.
Conclusions:
- The developed combination deposition method offers a viable approach for managing internal stress in optical thin films.
- Controlled internal stress is crucial for enhancing the durability and reliability of optical thin films.
