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Updated: Mar 7, 2026

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
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Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures

Published on: December 5, 2015

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A CO monolayer: first-principles design of a new direct band-gap semiconductor with excellent mechanical properties

Zi-Wei Teng1, Chun-Sheng Liu, Xiao-Hong Yan

  • 1Key Laboratory of Radio Frequency and Micro-Nano Electronics of Jiangsu Province, College of Electronic Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing 210023, China. csliu@njupt.edu.cn.

Nanoscale
|February 9, 2017
PubMed

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