Graphene-Assisted Antioxidation of Tungsten Disulfide Monolayers: Substrate and Electric-Field Effect

Transition metal dichalcogenides (TMDs) have emerged as promising materials to complement graphene for advanced optoelectronics. However, irreversible degradation of chemical vapor deposition-grown monolayer TMDs via oxidation under ambient conditions limits applications of TMD-based devices. Here, the growth of oxidation-resistant tungsten disulfide (WS₂ ) monolayers on graphene is demonstrated, and the mechanism of oxidation of WS₂ on SiO₂ , graphene/SiO₂ , and on graphene suspended in air is elucidated. While WS₂ on a SiO₂ substrate begins oxidation within weeks, epitaxially grown WS₂ on suspended graphene does not show any sign of oxidation, attributed to the screening effect of surface electric field caused by the substrate. The control of a local oxidation of WS₂ on a SiO₂ substrate by a local electric field created using an atomic force microscope tip is also demonstrated.