Photoimmobilization of zwitterionic polymers on surfaces to reduce cell adhesion

Simple and robust methods for modifying hydrophobic polymer surfaces with zwitterionic polymers using UV irradiation were developed. Two random zwitterionic copolymers consisting of either carboxybetaine or sulfobetaine methacrylamide monomers and monomers bearing a photolabile azidophenyl group were directly photoimmobilized on polymeric surfaces (polyester, polyethylene and polystyrene) via covalent interactions in a spatially controlled manner. These copolymers were also electrospun to form self-standing mats. The modified surfaces were characterized by X-ray photoelectron spectroscopy, atomic force microscopy, infrared spectroscopy and contact angle measurements. The electrospinning method involved the use of a trifluoroethanol solution with a copolymer concentration in the range from 2 to 10wt.%. BHK 21 cell adhesion to both modified surfaces and mats was dramatically reduced compared to unmodified surfaces.