Efficient reversible phase mask for TiO₂ submicron gratings directly printed on cylindrical surfaces

In this article we present a radial phase mask specially designed and manufactured for direct micro-structuration under UV photolithography of a cylindrical surface covered by a photoresist TiO₂ film. The period of the phase mask is sub-micron (between 480 nm and 720 nm) and allows direct printing on several types of cylindrical components. With this dedicated reversible phase mask we have demonstrated the feasibility of a TiO₂ grating with a period of 960 nm, printed on a SiO₂ cylinder or inside a SiO₂ tube of 8 mm diameter.