Confocal Fluorescence Microscopy
The Electrical Double Layer
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Ivan Shorubalko1, Kyoungjun Choi2, Michael Stiefel1
1Laboratory for Reliability Science and Technology, Empa (Swiss Federal Laboratories for Materials Science and Technology), Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.
Focused ion beam (FIB) technology enables nanometer-scale patterning of 2D materials. This study reveals a novel method using 2D layer perforation to precisely profile ion beams, achieving resolutions beyond beam size and uncovering unique beam shapes.
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