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Updated: Mar 3, 2026
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Measurement of Quantum Interference in a Silicon Ring Resonator Photon Source
Published on: April 4, 2017
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Performance prediction for silicon photonics integrated circuits with layout-dependent correlated manufacturing
Optics Express
|May 5, 2017
Summary
This study introduces an enhanced Monte Carlo (MC) simulation to predict how manufacturing variations affect photonics integrated circuits (PICs). The method accurately models layout-dependent variations, improving performance predictions for these complex optical devices.
Area of Science:
- Photonics
- Integrated Circuit Design
- Manufacturing Process Control
Background:
- Manufacturing variations significantly impact the performance of photonics integrated circuits (PICs).
- Accurate prediction of these variations is crucial for reliable circuit design and fabrication.
- Existing simulation methods often struggle to capture layout-dependent correlated variations.
Purpose of the Study:
- To develop an enhanced Monte Carlo (MC) simulation methodology for predicting the impact of layout-dependent correlated manufacturing variations on PIC performance.
- To establish a sub-nanometer accurate method for characterizing photonics manufacturing variations.
- To enable circuit simulations that account for correlated variations between components.
Main Methods:
- Characterization of waveguide width and height variations using spectral response of racetrack resonators.
- Development of models for layout-dependent enhanced MC simulation using netlist extraction.
- Simulation of spatially correlated physical variations across PICs on a discrete grid and mapping to circuit components.
Main Results:
- Demonstrated a sub-nanometer accurate method to characterize photonics manufacturing variations.
- Developed and detailed the simulation flow and theoretical models for layout-dependent enhanced MC simulation.
- Successfully predicted common-mode and differential-mode variations in ring-resonator filter circuits using the enhanced MC simulation.
Conclusions:
- The enhanced MC simulation methodology effectively predicts the performance impacts of layout-dependent correlated manufacturing variations in PICs.
- The developed characterization method provides high accuracy for extracting waveguide dimensions.
- This approach offers a powerful tool for improving the design and reliability of integrated photonics circuits.
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