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Updated: Mar 2, 2026

Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films
Published on: December 4, 2014
Ming-Wei Chen1,2, Dmitry Ovchinnikov1,2, Sorin Lazar3
1Electrical Engineering Institute, École Polytechnique Fédérale de Lausanne (EPFL) , CH-1015 Lausanne, Switzerland.
Atomically thin molybdenum diselenide (MoSe2) was grown using molecular beam epitaxy. This research demonstrates ambipolar transport in MoSe2 films, revealing that 2D variable-range hopping limits conductivity due to film disorder.
08:50Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
14:16Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
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