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Large-Scale Nanofabrication of Designed Nanostructures Using Angled Nanospherical-Lens Lithography for Surface
Yi-Hsin Chien1, Chang-Han Wang1, Chi-Ching Liu1
1Research Center for Applied Sciences, Academia Sinica , Taipei 11526, Taiwan.
ACS Applied Materials & Interfaces
|July 4, 2017
Summary
A new low-cost nanofabrication method, angled nanospherical-lens lithography (A-NLL), enables large-scale nanopatterning for nanophotonics. This technique facilitates the development of surface-enhanced infrared absorption (SEIRA) platforms without expensive equipment.
Area of Science:
- Nanophotonics
- Nanofabrication
- Materials Science
Background:
- Nanophotonics research has yielded novel concepts but faces limited product integration.
- Economic nanofabrication remains a bottleneck for nanophotonic applications.
Purpose of the Study:
- To demonstrate a versatile and low-cost nanofabrication method.
- To enable large-scale production of periodic nanopatterns for nanophotonic applications.
Main Methods:
- Angled nanospherical-lens lithography (A-NLL) was developed and utilized.
- Nanopatterns were designed within a two-dimensional polar chart and fabricated on substrates.
Main Results:
- Large-scale periodic nanopatterns exceeding 1 cm² were successfully produced.
- The fabricated patterns are suitable for surface-enhanced infrared absorption (SEIRA) platforms.
- The method eliminates the need for expensive and bulky IR microscopes.
Conclusions:
- The A-NLL method offers a cost-effective and scalable solution for nanofabrication.
- This technique is ideal for the industrialization of future nanophotonic applications.
- A-NLL advances the practical implementation of nanophotonic technologies.
