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Related Experiment Video

Updated: Feb 26, 2026

Utilization of Plasmonic and Photonic Crystal Nanostructures for Enhanced Micro- and Nanoparticle Manipulation
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Dual mode operation, highly selective nanohole array-based plasmonic colour filters.

Fatemeh Fouladi Mahani1, Arash Mokhtari1, Mahdiyeh Mehran1,2

  • 1Department of Electrical Engineering, Shahid Bahonar University, Kerman, 7616914111, Iran.

Nanotechnology
|July 21, 2017
PubMed
Summary

This study introduces dual-mode plasmonic colour filters (PCFs) using patterned aluminum films. These filters achieve high purity for both subtractive and additive colors, offering a CMOS-compatible alternative to chemical filters.

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Area of Science:

  • Nanophotonics
  • Plasmonics
  • Optical Materials

Background:

  • Conventional chemical color filters face limitations in purity and integration.
  • Nanostructured metal films offer a promising alternative for plasmonic color filters (PCFs).
  • Existing PCFs often struggle with poor color purity, generating either additive or subtractive colors.

Purpose of the Study:

  • To develop dual-mode plasmonic color filters (PCFs) with high color purity for both additive and subtractive color generation.
  • To demonstrate a novel PCF design compatible with CMOS processes.
  • To achieve polarization-insensitive color filtering.

Main Methods:

  • Fabrication of PCFs using an opaque aluminum film patterned with sub-wavelength holes.
  • Utilizing reflection mode for subtractive color generation (cyan, magenta, yellow).

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  • Employing transmission mode with a modified dielectric environment for additive color generation.

    • Main Results:

    • Reflection mode achieved high optical efficiencies (70%-80%) and stop-band widths (40-50 nm) for subtractive colors.
    • Transmission mode demonstrated significant color selectivity for additive colors.
    • The filters exhibited polarization insensitivity due to symmetric geometry.

    Conclusions:

    • A complete palette of pure subtractive and additive colors was realized using dual-mode PCFs.
    • The developed PCFs offer a simple, one-step lithography design compatible with CMOS processes.
    • Potential applications include multispectral imaging, CMOS image sensors, displays, and color printing.