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Related Experiment Video

Updated: Feb 26, 2026

Simple Lithography-Free Single Cell Micropatterning using Laser-Cut Stencils

Simple Lithography-Free Single Cell Micropatterning using Laser-Cut Stencils

Published on: April 3, 2020

Self-Collapse Lithography.

Chuanzhen Zhao^1,2, Xiaobin Xu^1,2, Qing Yang^1,2

¹California NanoSystems Institute, University of California, Los Angeles , Los Angeles, California 90095, United States.

|July 25, 2017

Summary

This summary is machine-generated.

We developed self-collapse lithography (SCL), a simple method for high-throughput nanoscale patterning. This technique uses collapsing elastomeric stamps to achieve sub-30 nm chemical patterns for advanced material fabrication.

Keywords:

Chemical lift-off lithography nanolithography self-collapse soft lithography

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Area of Science:

Materials Science
Nanotechnology
Chemical Engineering

Background:

Soft lithography is a key technique for nanoscale patterning.
Achieving sub-30 nm resolution with soft lithography often requires complex processes.

Purpose of the Study:

To introduce a facile, high-throughput soft lithography method for nanoscale chemical patterning.
To demonstrate sub-30 nm pattern generation using a self-collapse mechanism in elastomeric stamps.

Main Methods:

Utilized nanoscale channels at the edges of microscale relief features on elastomeric stamps.
Employed a chemical lift-off process where stamp collapse removes self-assembled monolayer (SAM) molecules.
Investigated the self-collapse mechanism using finite element simulations.

Main Results:

Achieved sub-30 nm patterns using masters prepared by conventional photolithography.
Demonstrated continuous control over feature sizes (∼2 μm to <30 nm) by adjusting stamp relief height and Young's modulus.
Successfully patterned 2D arrays of circles and squares, which served as resists for etching.

Conclusions:

Self-collapse lithography (SCL) is an effective method for nanoscale chemical lift-off patterning.
The study provides insights into the self-collapse behavior of elastomeric stamps.
SCL offers a versatile approach for fabricating nanoscale patterns in various materials.