Related Experiment Video
Updated: Feb 26, 2026

Analysis of Contact Interfaces for Single GaN Nanowire Devices
Published on: November 15, 2013
High-Throughput Structural and Functional Characterization of the Thin Film Materials System Ni-Co-Al
Peer Decker1, Dennis Naujoks1, Dennis Langenkämper1
1Institute for Materials, Ruhr-Universität Bochum , 44780 Bochum, Germany.
Abstract:
High-throughput methods were used to investigate a Ni-Co-Al thin film materials library, which is of interest for structural and functional applications (superalloys, shape memory alloys). X-ray diffraction (XRD) measurements were performed to identify the phase regions of the Ni-Co-Al system in its state after annealing at 600 °C. Optical, electrical, and magneto-optical measurements were performed to map functional properties and confirm XRD results. All results and literature data were used to propose a ternary thin film phase diagram of the Ni-Co-Al thin film system.

