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Improved Resin-Zirconia Bonding by Room Temperature Hydrofluoric Acid Etching
Mun-Hwan Lee1, Jun Sik Son2, Kyo-Han Kim3
1Department of Medical & Biological Engineering, Graduate School, Kyungpook National University, 2-188-1 Samduk-dong, Jung-gu, Daegu 700-412, Korea. leemunhwan@knu.ac.kr.
Materials (Basel, Switzerland)
|August 10, 2017
Summary
Hydrofluoric acid (HF) etching improves dental zirconia bond strength by creating retentive sites. This study shows HF etching enhances resin-zirconia adhesion, offering a viable surface treatment for dental ceramics.
Area of Science:
- Dental Materials Science
- Biomaterials Engineering
- Ceramic Surface Modification
Background:
- Dental zirconia restorations require durable adhesion to resin cements.
- Current surface treatments for zirconia may have limitations.
- Hydrofluoric acid (HF) is a potential etchant for zirconia surface modification.
Purpose of the Study:
- To evaluate the shear bond strength of non-self-adhesive resin to HF-etched zirconia.
- To compare HF etching with air abrasion for zirconia surface treatment.
- To investigate the effect of HF concentration and etching time on bond strength.
Main Methods:
- Zirconia plates were etched with varying concentrations (10-30%) and times (5-30 min) of HF.
- Surface characterization included wettability and porosity analysis.
- Shear bond strength tests were performed after water storage and thermocycling.
Main Results:
- HF etching created micro- and nano-porosities on zirconia surfaces.
- Increased HF concentration and etching time enhanced surface wettability and roughness.
- Higher HF concentrations and longer etching times resulted in significantly higher bond strength values.
Conclusions:
- HF etching at room temperature effectively modifies zirconia surfaces for improved resin bonding.
- The formation of retentive sites via HF etching enhances resin-zirconia shear bond strength.
- HF etching presents a promising method for improving the durability of resin-zirconia interfaces in dental applications.
