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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

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Scanning Probe Photonic Nanojet Lithography.

Andrea Jacassi¹, Francesco Tantussi¹, Michele Dipalo¹

¹Istituto Italiano di Tecnologia , Via Morego 30, Genova, 16163, Italy.

ACS Applied Materials & Interfaces

|August 31, 2017

Summary

This study introduces a novel microsphere-based optical lithography method for creating arbitrary subwavelength patterns. This cost-effective technique offers high resolution, comparable to commercial instruments, but at a fraction of the price.

Keywords:

microbead nanofabrication nanojet optical lithography photonics

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Area of Science:

Nanotechnology
Optical Engineering
Materials Science

Background:

Microsphere-based optical lithography uses beads to focus light, creating subwavelength structures.
Current methods are limited to regular patterns, restricting applications.

Purpose of the Study:

To develop a novel microsphere-based optical lithography technique.
To enable the generation of arbitrary patterns with high subwavelength resolution.

Main Methods:

A single microsphere was embedded in an Atomic Force Microscope (AFM) cantilever.
AFM motors precisely controlled the microsphere to write patterns on a photoresist.

Main Results:

Achieved arbitrary pattern generation with subwavelength resolution (down to 290 nm using a 405 nm laser).
Demonstrated performance competitive with commercial high-resolution instruments.
Offered a significant cost reduction (one order of magnitude).

Conclusions:

The novel technique allows for cost-effective, high-resolution optical lithography.
This method facilitates the creation of any arbitrary pattern, expanding application possibilities.
Paves the way for integrating this technology into existing AFM systems.