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New Approaches to the Computer Simulation of Amorphous Alloys: A Review
Ariel A Valladares1, Juan A Díaz-Celaya2, Jonathan Galván-Colín3
1Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Ciudad Universitaria, Apartado Postal 70-360, Mexico, D.F. 04510, Mexico. valladar@unam.mx.
Materials (Basel, Switzerland)
|September 8, 2017
Summary
Researchers developed a new computational method to generate amorphous atomic structures for various alloys. This technique accurately predicts material properties, showing excellent agreement with experimental data.
Area of Science:
- Computational materials science
- Condensed matter physics
- Solid-state chemistry
Background:
- Generating amorphous materials computationally is challenging.
- Accurate simulation of atomic structures is crucial for predicting material properties.
Purpose of the Study:
- To present a novel computational method for generating amorphous atomic topologies.
- To validate the method by comparing simulation results with experimental data.
- To investigate the impact of topological disorder on material properties.
Main Methods:
- Ab initio approach using density functional theory.
- Computationally thermally-randomized periodically-continued cells (≥108 atoms).
- Undermelt-quench approach with optimized time steps.
Main Results:
- Successful generation of amorphous structures for SiH, SiN, CN, SiC, GeSe2, AlN, AlSi, and CuZr.
- Excellent agreement between calculated and experimental radial distribution functions.
- Studies on the effects of topological disorder on electronic, vibrational, and optical properties.
Conclusions:
- The developed undermelt-quench method is effective for generating realistic amorphous alloy structures.
- The computational approach provides accurate predictions of material properties.
- Further studies can explore the influence of disorder on diverse material characteristics.
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