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Updated: Feb 23, 2026

Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
Three-fold Symmetric Doping Mechanism in GaAs Nanowires
M H T Dastjerdi1, E M Fiordaliso2, E D Leshchenko3
1Department of Engineering Physics, Centre for Emerging Device Technologies, McMaster University , Hamilton, Ontario Canada , L8S 4L7.
Abstract:
A new dopant incorporation mechanism in Ga-assisted GaAs nanowires grown by molecular beam epitaxy is reported. Off-axis electron holography revealed that p-type Be dopants introduced in situ during molecular beam epitaxy growth of the nanowires were distributed inhomogeneously in the nanowire cross-section, perpendicular to the growth direction. The active dopants showed a remarkable azimuthal distribution along the (111)B flat top of the nanowires, which is attributed to preferred incorporation along 3-fold symmetric truncated facets under the Ga droplet. A diffusion model is presented to explain the unique radial and azimuthal variation of the active dopants in the GaAs nanowires.
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