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Updated: Feb 22, 2026

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
Published on: January 23, 2013
Wetting Regimes for Residual-Layer-Free Transfer Molding at Micro- and Nanoscales
Michael E Deagen1, Linda S Schadler1, Chaitanya K Ullal1
1Center for Lighting Enabled Systems and Applications, Department of Materials Science and Engineering, Rensselaer Polytechnic Institute , 110 8th Street, Troy, New York 12180, United States.
Abstract:
Transfer molding offers a low-cost approach to large-area fabrication of isolated structures in a variety of materials when recessed features of the open-faced mold are filled without leaving a residual layer on the plateaus of the mold. Considering both macroscale dewetting and microscale capillary flow, a proposed map of wetting regimes for blade meniscus coating provides a guide for achieving discontinuous dewetting at maximum throughput. Dependence of meniscus morphology on the azimuthal orientation of the stamp provides insight into the dominant mechanisms for discontinuous dewetting of one-dimensional (1-D) patterns. Critical meniscus velocity is measured and residual-layer-free filling is demonstrated for 1-D patterned soft molds (stamps) with periods ranging from 140 nm to 6 μm. Transfer of isolated lines, and multilayer woodpile structures were achieved through plasma bonding. These results are relevant to other roll-to-roll compatible processes for scalable production of high-resolution structures across large areas.

