Pitch Control of Hexagonal Non-Close-Packed Nanosphere Arrays Using Isotropic Deformation of an Elastomer

Self-assembly of colloidal nanospheres combined with various nanofabrication techniques produces an ever-increasing range of two-dimensional (2D) ordered nanostructures, although the pattern periodicity is typically bound to the original interparticle spacing. Deformable soft lithography using controlled deformation of elastomeric substrates and subsequent contact printing transfer offer a versatile method to systematically control the lattice spacing and arrangements of the 2D nanosphere array. However, the anisotropic nature of uniaxial and biaxial stretching as well as the strain limit of solvent swelling makes it difficult to create well-separated, ordered 2D nanosphere arrays with large-area hexagonal arrangements. In this paper, we report a simple, facile approach to fabricate such arrays of polystyrene nanospheres using a custom-made radial stretching apparatus. The maximum stretchability and spatial uniformity of the poly(dimethylsiloxane) (PDMS) elastomeric substrate is systematically investigated. A pitch increase as large as 213% is demonstrated using a single stretching-and-transfer process, which is at least 3 times larger than the maximum pitch increase achievable using a single swelling-and-transfer process. Unlike the colloidal arrays generated by the uniaxial and biaxial stretching, the isotropic expansion of radial stretching allows the hexagonal array to retain its original structure across the entire substrate. Upon radial strain applied to the PDMS sheet, the nanosphere array with modified pitch is transferred to a variety of target substrates, exhibiting different optical behaviors and serving as an etch mask or a template for molding.