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Plasmonic Lithography Utilizing Epsilon Near Zero Hyperbolic Metamaterial.

Xi Chen1, Cheng Zhang1, Fan Yang1

  • 1Applied Physics and ‡Department of Electrical Engineering and Computer Science, University of Michigan , Ann Arbor, Michigan 48109, United States.

ACS Nano
|October 3, 2017
PubMed
Summary

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This study demonstrates hyperbolic metamaterials for advanced plasmonic lithography, achieving 58.3 nm periodic patterns. This technique enables significant period reduction for nanoscale fabrication.

Area of Science:

  • Materials Science
  • Nanotechnology
  • Optics

Background:

  • Hyperbolic metamaterials (HMMs) offer unique electromagnetic properties.
  • Type II HMMs with near-zero permittivity (epsilon-near-zero, ENZ) exhibit high anisotropy.
  • These properties enable novel applications in nanoscale patterning.

Purpose of the Study:

  • Investigate a type II ENZ HMM for plasmonic lithography.
  • Achieve sub-wavelength periodic patterns with high resolution.
  • Explore the potential for period reduction in lithographic processes.

Main Methods:

  • Utilized a type II ENZ HMM composed of aluminum/aluminum oxide films.
  • Employed a specially designed lithography system exploiting HMM properties.
  • Leveraged the interference of third-order diffracted light for pattern formation.
Keywords:
UV lithographyepsilon near zerohyperbolic metamaterialinterferencenanomanufacturingspatial filtering

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Main Results:

  • Successfully fabricated periodic patterns with a half pitch of 58.3 nm.
  • Achieved a period reduction of 1/6 compared to the mask (700 nm).
  • Demonstrated a pattern size of approximately 1/7 of the incident light's wavelength.

Conclusions:

  • Type II ENZ HMMs are effective for high-resolution plasmonic lithography.
  • The demonstrated method allows for significant period reduction in nanoscale fabrication.
  • Theoretical analysis is applicable to various materials and deep ultraviolet wavelengths.