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Probing the Limits of Supramolecular G-Quadruplexes Using Atomistic Molecular Dynamics Simulations
Marilyn García-Arriaga1, Maxier Acosta-Santiago1, Antony Cruz2
1Department of Chemistry and Molecular Sciences Research Center, University of Puerto Rico at Río Piedras, San Juan, PR, 00926.
Summary
Researchers explored how 8-aryl-2'-deoxyguanosine derivatives self-assemble into G-quadruplexes (SGQs). Findings reveal assembly rules and stability factors, guiding the development of new functional materials from these supramolecular structures.
Area of Science:
- Supramolecular Chemistry
- Biophysical Chemistry
- Materials Science
Background:
- Guanosine derivatives form supramolecular G-quadruplexes (SGQs) through cation-mediated self-assembly.
- 8-aryl-2 -deoxyguanosine derivatives (8ArGs) typically form SGQs with two to four tetrads (2T-4T).
- Understanding assembly pathways is crucial for designing functional SGQ materials.
Purpose of the Study:
- To investigate the assembly pathways and stability of SGQs formed by 8ArGs.
- To elucidate the factors governing the formation of higher-order SGQ structures.
- To provide guidelines for the rational design of novel SGQ-based functional materials.
Main Methods:
- Theoretical modeling of configurational space for 8ArG self-assembly.
- Molecular dynamics simulations (MDS) of selected SGQ structures.
- Analysis of interfacial contacts and energetic contributions (entropic costs, dipolar interactions).
Main Results:
- Hierarchical assembly pathways minimize entropic costs for larger SGQs.
- SGQ stability follows an order of interfacial contacts: hh > ht > tt, with exceptions due to allosteric effects.
- Repulsive dipolar interactions between O4' moieties disfavor the tt interface; higher-order assemblies (≥5T) are energetically unfavorable.
Conclusions:
- Assembly of 8ArG-based SGQs is governed by specific interfacial preferences and energetic balances.
- The study identifies key factors limiting the size and structure of SGQs.
- Findings offer a framework for engineering SGQs with tailored properties for advanced material applications.

