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Rubidium containing thin films by atomic layer deposition.

Henrik H Sønsteby1, Kristian Weibye, Jon E Bratvold

  • 1Department of Chemistry, University of Oslo, Norway. henrik.sonsteby@kjemi.uio.no.

Dalton Transactions (Cambridge, England : 2003)
|November 14, 2017
PubMed
Summary

Atomic layer deposition (ALD) now includes rubidium-containing films, enabling new materials. This research demonstrates controlled rubidium incorporation in oxides and stabilized perovskites, expanding ALD applications.

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Area of Science:

  • Materials Science
  • Chemical Engineering
  • Thin Film Deposition

Background:

  • Atomic layer deposition (ALD) is a powerful technique for precise thin film fabrication.
  • Existing ALD precursors primarily focus on alkali metals like lithium, sodium, and potassium.
  • Exploration of rubidium-based materials via ALD remains largely uncharted.

Purpose of the Study:

  • To extend the application range of ALD to include rubidium-containing films.
  • To investigate rubidium t-butoxide as a viable ALD precursor.
  • To demonstrate the feasibility of depositing novel rubidium-based compounds.

Main Methods:

  • Utilized atomic layer deposition (ALD) with rubidium t-butoxide as a precursor.
  • Investigated the Rb-Ti-O and Rb-Nb-O material systems.
  • Characterized the composition and structure of deposited thin films, including doping levels and phase stabilization.

Main Results:

  • Successfully deposited rubidium-containing films using ALD.
  • Rubidium t-butoxide exhibited promising precursor behavior, analogous to other alkali metal alkoxides.
  • Achieved controllable doping of Rb:TiOx up to 20% and major component incorporation in Rb:NbOx.
  • Stabilized the perovskite RbNbO3 on SrTiO3 (100) substrates, a phase difficult to obtain in bulk.

Conclusions:

  • ALD can be effectively used to deposit rubidium-containing films.
  • This work introduces new material systems for ALD and materials chemistry.
  • Opens avenues for exploring novel thin films and compounds previously inaccessible.