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Single Layer Surface-Grafted PMMA as a Negative-Tone e-Beam Resist.

Hirotaka Yamada1, Ferhat Aydinoglu1, Yaoze Liu1

  • 1Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo , 200 University Avenue West, Waterloo, Ontario N2L 3G1, Canada.

Langmuir : the ACS Journal of Surfaces and Colloids
|November 14, 2017
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This study presents a novel method for nanofabrication on irregular surfaces using surface-grafted polymethyl methacrylate (PMMA) as a negative-tone electron beam resist. Thermal treatment enables development, overcoming limitations of traditional spin coating for nonflat substrates.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Electron Beam Lithography

Background:

  • Nanofabrication on nonflat or irregular surfaces presents significant challenges in electron beam lithography.
  • Conventional spin coating techniques fail to produce uniform resist films on such substrates.

Purpose of the Study:

  • To demonstrate the utility of single-layer surface-grafted polymethyl methacrylate (PMMA) as a negative-tone electron beam resist.
  • To enable nanofabrication on nonflat and irregular surfaces using PMMA.

Main Methods:

  • Utilizing single-layer surface-grafted PMMA as a negative-tone resist.
  • Employing thermal treatment at 360 °C for 1 minute as the developer, instead of traditional solvents.

Main Results:

  • Successfully applied surface-grafted PMMA to both flat and nonflat/irregular surfaces for nanofabrication.
  • Demonstrated that thermal treatment is an effective development method for this negative-tone resist system.

Conclusions:

  • Single-layer surface-grafted PMMA is a viable negative-tone electron beam resist for nonflat surfaces.
  • Thermal development offers a new pathway for resist processing in electron beam lithography on complex topographies.