You might also read
Articles linked to this work by shared authors, journal, and citation graph.
Updated: Feb 18, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Hirotaka Yamada1, Ferhat Aydinoglu1, Yaoze Liu1
1Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo , 200 University Avenue West, Waterloo, Ontario N2L 3G1, Canada.
This study presents a novel method for nanofabrication on irregular surfaces using surface-grafted polymethyl methacrylate (PMMA) as a negative-tone electron beam resist. Thermal treatment enables development, overcoming limitations of traditional spin coating for nonflat substrates.
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: