An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell.

Area of Science:

• Plasma physics
• Materials science

Background:

• The Gaseous Electronics Conference (GEC) RF Reference Cell is a standard tool for plasma research.
• Extending its operating range is crucial for advanced plasma studies.

Purpose of the Study:

• To develop and characterize a novel inductively coupled plasma (ICP) source for the GEC RF Reference Cell.
• To investigate plasma properties in argon, chlorine, and nitrogen using the new ICP source.

Main Methods:

• Replaced the standard parallel-plate electrode with an ICP source.
• Utilized voltage/current probes, Langmuir probes, and an 80 GHz interferometer for plasma diagnostics.
• Operated the system at pressures from 0.1 Pa to 3 Pa and deposited powers from 20 W to 300 W.

Main Results:

• Achieved peak electron densities from 10^10/cm^3 to 10^12/cm^3 with electron temperatures around 4 eV.
• Observed bimodal discharge operation (dim and bright modes) in chlorine and nitrogen with hysteresis.
• Identified film deposition affecting mode transitions and plasma characteristics after prolonged high-power operation.

Conclusions:

• The ICP source successfully extends the GEC RF Reference Cell's operating range.
• Bimodal operation and hysteresis in chlorine/nitrogen discharges are significant findings.
• Film deposition impacts plasma behavior, necessitating further investigation for long-term stability.