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Updated: Feb 18, 2026

Fabrication and Optimization of Type II Silicon Clathrate Films
Published on: October 14, 2025
Low oxidation state silicon clusters - synthesis and structure of [NHCDippCu(η4-Si9)]3
Felix S Geitner1, Thomas F Fässler
1WACKER-Institute for Silicon Chemistry and Department of Chemistry, Technische Universität München, Lichtenbergstraße 4, 85747 Garching, Germany.
Abstract:
The reaction of NHCDippCuCl with the silicide phases A12Si17 (A: K, K/Rb, Rb) in NH3(l) yields [NHCDippCu(η4-Si9)]3- (1) as only the third example of a substituted [Si9] cluster. The corresponding salts A3[A(2.2.2-crypt)]3[NHCDippCu(η4-Si9)]2·26NH3 (A: K (1a), K/Rb (1b), Rb (1c)) crystallize isostructurally in the space group P1[combining macron] and have been characterized by single crystal structure determination. ESI-MS and NMR experiments reveal that the anion [NHCDippCu(η4-Si9)]3- can also be transferred to pyridine or acetonitrile solutions at low temperature. However, at room temperature dissociation under the release of the NHC ligand occurs. Variation of the NHC ligand in the [Cu-NHC]+-substituted silicide clusters is possible, whereas the reactions of K12Si17 with the corresponding NHCDippMCl (M: Ag, Au) complexes result in a partial oxidation of the silicide clusters, without attachment of [M-NHC]+, yielding [Si9]3- species.
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