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Efficient high-order suppression system for a metrology beamline.

A Sokolov1, M G Sertsu1, A Gaupp1

  • 1Helmholtz Zentrum Berlin (BESSY-II), Albert-Einstein-Strasse 15, D-12489 Berlin, Germany.

Journal of Synchrotron Radiation
|December 23, 2017
PubMed
Summary

A new high-order suppression system (HiOS) uses mirrors to improve spectral purity for synchrotron radiation. This system enhances metrology applications by maximizing radiation suppression and transmission.

Keywords:
PGM beamlineXUV optical elementsat-wavelength metrologydiffraction gratingshigher ordersreflectometer

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Area of Science:

  • Synchrotron Radiation Science
  • Optical Metrology
  • Beamline Instrumentation

Background:

  • High-quality metrology using synchrotron radiation necessitates high spectral purity of the incident beam.
  • Traditional methods employ transmission filters, which can have limitations in suppressing higher-order radiation from monochromators.

Purpose of the Study:

  • To commission and evaluate a novel high-order suppression system (HiOS) at the BESSY-II synchrotron facility.
  • To assess the performance of the HiOS for improving spectral purity in the EUV and XUV ranges.

Main Methods:

  • Implementation of a four-reflection mirror-based high-order suppression system (HiOS) at an at-wavelength metrology station.
  • Utilized parallel-aligned mirror pairs with adjustable coatings and tunable incidence angles for optimization.
  • Compared measured performance data with simulations for the EUV and XUV energy ranges.

Main Results:

  • The commissioned HiOS effectively suppresses higher-order radiation, enhancing spectral purity.
  • Optimized mirror coatings and incidence angles achieved a favorable figure of merit (maximum suppression at maximum transmission).
  • Measured performance closely matched simulation predictions for the tested energy ranges.

Conclusions:

  • The mirror-based HiOS is a viable and effective solution for achieving high spectral purity in synchrotron radiation metrology.
  • The system's flexibility in terms of coatings and incidence angle allows for tailored performance across different energy ranges.
  • The developed HiOS is suitable for advanced metrology applications requiring high-quality photon beams.